Invention Grant
- Patent Title: Seed crystal for single crystal 4H—SiC growth and method for processing the same
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Application No.: US16963521Application Date: 2018-12-21
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Publication No.: US11781244B2Publication Date: 2023-10-10
- Inventor: Takanori Kido , Masatake Nagaya , Hidetaka Takaba
- Applicant: SHOWA DENKO K.K. , DENSO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: RESONAC CORPORATION,DENSO CORPORATION
- Current Assignee: RESONAC CORPORATION,DENSO CORPORATION
- Current Assignee Address: JP Tokyo; JP Kariya
- Agency: Sughrue Mion, PLLC
- Priority: JP 18009989 2018.01.24
- International Application: PCT/JP2018/047225 2018.12.21
- International Announcement: WO2019/146336A 2019.08.01
- Date entered country: 2020-07-21
- Main IPC: C30B29/36
- IPC: C30B29/36 ; B24B7/22 ; C30B33/00 ; H01L21/02

Abstract:
A seed crystal for single crystal 4H-SiC growth of the present invention is a disk-shaped seed crystal for single crystal 4H-SiC growth having a diameter of more than 150 mm and having a thickness within a range of more than or equal to 1 mm and less than or equal to 0.03 times of the diameter, in which one surface on which the single crystal 4H-SiC is grown is a mirror surface and an Ra of the other surface is more than 10 nm, and an absolute value of magnitude of waviness in a state where the seed crystal is freely deformed so that an internal stress distribution is reduced is less than or equal to 12 μm.
Public/Granted literature
- US20210047750A1 SEED CRYSTAL FOR SINGLE CRYSTAL 4H-SiC GROWTH AND METHOD FOR PROCESSING THE SAME Public/Granted day:2021-02-18
Information query
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