Invention Grant
- Patent Title: Method for cleaning receptor layer of surface stress sensor
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Application No.: US17267094Application Date: 2019-08-28
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Publication No.: US11796408B2Publication Date: 2023-10-24
- Inventor: Genki Yoshikawa , Takahiro Nemoto , Makito Nakatsu , Naoto Takeda , Kota Shiba , Kosuke Minami
- Applicant: NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Applicant Address: JP Ibaraki
- Assignee: NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Current Assignee: NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Current Assignee Address: JP Ibaraki
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP 18164127 2018.09.03
- International Application: PCT/JP2019/033612 2019.08.28
- International Announcement: WO2020/050110A 2020.03.12
- Date entered country: 2021-02-09
- Main IPC: G01L1/00
- IPC: G01L1/00 ; G01L1/26 ; B08B7/00 ; G01L1/22 ; H01L29/84

Abstract:
A method for cleaning a receptor layer of a surface stress sensor according to an embodiment of the present invention includes, in a surface stress sensor that detects a change in surface stress of a thin film, the change being caused by a receptor layer disposed on a surface of the thin film, causing at least a part of a surface region of the thin film to generate heat or supplying heat to the receptor layer from the outside of the surface stress sensor. This makes it possible to easily perform efficient cleaning of a surface stress sensor such as a sensor that performs detection using a piezoresistor while avoiding structural complications as much as possible.
Public/Granted literature
- US20210215556A1 METHOD FOR CLEANING RECEPTOR LAYER OF SURFACE STRESS SENSOR Public/Granted day:2021-07-15
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