- 专利标题： High-entropy ultra-high temperature ceramic (HE-UHTC) coatings and deposition methods thereof
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申请号： US17842330申请日： 2022-06-16
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公开(公告)号： US11802088B1公开(公告)日： 2023-10-31
- 发明人: Ambreen Nisar , Arvind Agarwal , Cheng Zhang
- 申请人： Ambreen Nisar , Arvind Agarwal , Cheng Zhang
- 申请人地址： US FL Miami
- 专利权人： THE FLORIDA INTERNATIONAL UNIVERSITY BOARD OF TRUSTEES
- 当前专利权人： THE FLORIDA INTERNATIONAL UNIVERSITY BOARD OF TRUSTEES
- 当前专利权人地址： US FL Miami
- 代理机构： Saliwanchik, Lloyd & Eisenschenk
- 主分类号： C04B35/56
- IPC分类号： C04B35/56 ; C04B35/626 ; C04B35/64
摘要：
High-entropy ultra-high temperature ceramics (HE-UHTC) coatings deposited on substrates, as well methods for depositing the HE-UHTC coatings on the substrates, are provided. An HE-UHTC electrode can be fabricated via spark plasma sintering (SPS) and then a thin coating of the HE-UHTC can be deposited in a precision-controlled manner on a substrate via an electro-spark deposition process.
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