Invention Grant
- Patent Title: Systems and methods for vacuum furnace post-processing
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Application No.: US17187105Application Date: 2021-02-26
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Publication No.: US11802732B2Publication Date: 2023-10-31
- Inventor: Guolin Oo
- Applicant: Raytheon Technologies Corporation
- Applicant Address: US CT Farmington
- Assignee: RTX Corporation
- Current Assignee: RTX Corporation
- Current Assignee Address: US CT Farmington
- Agency: SNELL & WILMER L.L.P.
- Main IPC: F27D21/02
- IPC: F27D21/02 ; F27D7/06
Abstract:
A method of generating a loaded layout in a vacuum furnace corresponding to an actual layout in the vacuum furnace during operation of the vacuum furnace may comprise receiving, via a processor, a visual data of a loading process of the vacuum furnace from a camera; comparing, via the processor, the visual data to a predetermined maximum capacity layout for the vacuum furnace; and arranging, via the processor, the visual data into the loaded layout in response to comparing the visual data.
Public/Granted literature
- US20220276006A1 SYSTEMS AND METHODS FOR VACUUM FURNACE POST-PROCESSING Public/Granted day:2022-09-01
Information query
