Invention Grant
- Patent Title: Wafer processing apparatus including equipment front end module (EFEM) and wafer processing method using the same
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Application No.: US17718574Application Date: 2022-04-12
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Publication No.: US11804393B2Publication Date: 2023-10-31
- Inventor: Jinhyuk Choi , Jonghwi Seo , Kongwoo Lee , Beomsoo Hwang
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR 20210120547 2021.09.09
- Main IPC: H01L21/677
- IPC: H01L21/677 ; H01L21/687 ; H01L21/67

Abstract:
A wafer processing apparatus of an embodiment of the present disclosure may include an equipment front end module (EFEM), a wafer transfer chamber, a wafer processing chamber, and a wafer transfer arm. In addition, the EFEM may include an atmosphere control chamber configured to store a wafer carrier accommodating wafers, an upper air supplier configured to supply air into the atmosphere control chamber, an EFEM chamber under the atmosphere control chamber, a load lock arranged to be vertically overlapped by at least a portion of the EFEM chamber, and an EFEM arm configured to transfer the wafer carrier.
Public/Granted literature
Information query
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