Invention Grant
- Patent Title: Silicon and silica nanostructures and method of making silicon and silica nanostructures
-
Application No.: US17545493Application Date: 2021-12-08
-
Publication No.: US11807571B2Publication Date: 2023-11-07
- Inventor: Albert Carrilero , Prantik Mazumder , Valerio Pruneri
- Applicant: CORNING INCORPORATED , ICFO
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated,ICFO
- Current Assignee: Corning Incorporated,ICFO
- Current Assignee Address: US NY Corning; ES Barcelona
- Agent Svetlana Short; Irene L. Brookins
- The original application number of the division: US16891606 2020.06.03
- Main IPC: C30B29/06
- IPC: C30B29/06 ; C03C15/00 ; C30B29/60 ; C30B29/18 ; C30B11/12 ; C01B33/12

Abstract:
Provided herein are methods for forming one or more silicon nanostructures, such as silicon nanotubes, and a silica-containing glass substrate. As a result of the process used to prepare the silicon nanostructures, the silica-containing glass substrate comprises one or more nanopillars and the one or more silicon nanostructures extend from the nanopillars of the silica-containing glass substrate. The silicon nanostructures include nanotubes and optionally nanowires. A further aspect is a method for preparing silicon nanostructures on a silica-containing glass substrate. The method includes providing one or more metal nanoparticles on a silica-containing glass substrate and then performing reactive ion etching of the silica-containing glass substrate under conditions that are suitable for the formation of one or more silicon nanostructures.
Public/Granted literature
- US20220098094A1 SILICON AND SILICA NANOSTRUCTURES AND METHOD OF MAKING SILICON AND SILICA NANOSTRUCTURES Public/Granted day:2022-03-31
Information query
IPC分类: