Invention Grant
- Patent Title: Method and apparatus for forming a patterned layer of carbon, method of forming a patterned layer of material
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Application No.: US16969088Application Date: 2019-02-26
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Publication No.: US11807937B2Publication Date: 2023-11-07
- Inventor: Sonia Castellanos Ortega , Jan Verhoeven , Joost Wilhelmus Maria Frenken , Pavlo Antonov , Nicolaas Ten Kate , Olivier Christian Maurice Lugier
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP 159654 2018.03.02
- International Application: PCT/EP2019/054680 2019.02.26
- International Announcement: WO2019/166409A 2019.09.06
- Date entered country: 2020-08-11
- Main IPC: C23C16/04
- IPC: C23C16/04 ; C23C16/26 ; C23C16/48 ; H01L21/02 ; H01L29/16
Abstract:
Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.
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