Invention Grant
- Patent Title: Methods for depositing molybdenum sulfide
-
Application No.: US17028156Application Date: 2020-09-22
-
Publication No.: US11821079B2Publication Date: 2023-11-21
- Inventor: Keith T. Wong , HyoJin Kim
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilia Whitney LLC
- Main IPC: C23C16/30
- IPC: C23C16/30 ; C23C16/02 ; C23C16/455 ; C23C16/56 ; H10B12/00
Abstract:
Methods of depositing a molybdenum sulfide film with increased sulfur:molybdenum ratio are described. The methods include pre-cleaning a dielectric material with oxygen radicals prior to formation of a molybdenum sulfide film that has a lower oxygen content than would be formed without the pre-cleaning.
Public/Granted literature
- US20210087677A1 METHODS FOR DEPOSITING MOLYBDENUM SULFIDE Public/Granted day:2021-03-25
Information query
IPC分类:
