Invention Grant
- Patent Title: Polishing system, learning device, and learning method of learning device
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Application No.: US16774010Application Date: 2020-01-28
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Publication No.: US11833635B2Publication Date: 2023-12-05
- Inventor: Keitaro Fujii , Masayuki Takahashi
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP 19027271 2019.02.19
- Main IPC: B24B37/005
- IPC: B24B37/005 ; B24B37/04 ; B24B49/16 ; B24B49/14 ; B24B49/10 ; B24B37/10
Abstract:
A learning device includes a learning unit that executes learning of determining a corrected polishing condition by updating an action value function based on state information including at least one polishing condition and a calculation result calculated based on at least one measured value during polishing.
Public/Granted literature
- US20200262023A1 POLISHING SYSTEM, LEARNING DEVICE, AND LEARNING METHOD OF LEARNING DEVICE Public/Granted day:2020-08-20
Information query
