Invention Grant
- Patent Title: System for a semiconductor fabrication facility and method for operating the same
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Application No.: US16925285Application Date: 2020-07-09
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Publication No.: US11848222B2Publication Date: 2023-12-19
- Inventor: Chuan Wei Lin , Fu-Hsien Li , Yong-Jyu Lin , Rong-Shen Chen , Chi-Feng Tung , Hsiang Yin Shen
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT LAW
- Agent Anthony King
- Main IPC: H01L21/677
- IPC: H01L21/677 ; H01L21/68
Abstract:
A system for a semiconductor fabrication facility (FAB) includes an orientation tool and a transporting tool configured to transport at least one customized part. The orientation tool includes a port configured to receive the workpiece, a sensor configured to detect an orientation of the workpiece received in the port and a rotation mechanism configured to turn the workpiece received in the port.
Public/Granted literature
- US20220013395A1 SYSTEM FOR A SEMICONDUCTOR FABRICATION FACILITY AND METHOD FOR OPERATING THE SAME Public/Granted day:2022-01-13
Information query
IPC分类:
