Invention Grant
- Patent Title: Chemical vapor deposition during additive manufacturing
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Application No.: US15631955Application Date: 2017-06-23
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Publication No.: US11851763B2Publication Date: 2023-12-26
- Inventor: Scott Alan Gold
- Applicant: GENERAL ELECTRIC COMPANY
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agency: Dinsmore & Shohl LLP
- Main IPC: B22F7/04
- IPC: B22F7/04 ; C23C16/50 ; B33Y10/00 ; B33Y30/00 ; B28B1/00 ; B33Y40/00 ; C23C16/04 ; C23C16/52 ; B23K15/00 ; B23K26/342 ; B23K26/082 ; B29C64/153 ; B22F7/06 ; B29C64/165 ; B29C64/20 ; B22F7/02 ; B33Y40/20 ; B22F10/14 ; B22F10/28 ; B22F12/49 ; B22F12/67 ; B22F12/70 ; B22F10/50 ; B22F10/62 ; B22F3/24 ; B22F12/00 ; B22F10/36 ; B22F10/64
Abstract:
The present disclosure generally relates to methods and apparatuses for chemical vapor deposition (CVD) during additive manufacturing (AM) processes. Such methods and apparatuses can be used to embed chemical signatures into manufactured objects, and such embedded chemical signatures may find use in anti-counterfeiting operations and in manufacture of objects with multiple materials.
Public/Granted literature
- US20180369912A1 CHEMICAL VAPOR DEPOSITION DURING ADDITIVE MANUFACTURING Public/Granted day:2018-12-27
Information query
