Invention Grant
- Patent Title: Wafer manufacturing method and laminated device chip manufacturing method
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Application No.: US17453411Application Date: 2021-11-03
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Publication No.: US11854891B2Publication Date: 2023-12-26
- Inventor: Youngsuk Kim , Byeongdeck Jang , Akihito Kawai , Shunsuke Teranishi
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JP 20191853 2020.11.18
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L21/56 ; H01L21/304 ; H01L21/268

Abstract:
A wafer manufacturing method includes a wafer preparing step of preparing a wafer including a semiconductor device formed in each of a plurality of regions demarcated by a plurality of streets intersecting each other, a removing step of separating, from the wafer, a defective device region including a semiconductor device determined to be a defective product among a plurality of the semiconductor devices formed in the wafer, and a fitting step of fitting, into a through hole formed by separating the defective device region from the wafer, a device chip including a semiconductor device as a non-defective product having same functions as those of the semiconductor device determined to be a defective product and having a size capable of being fitted into the through hole.
Public/Granted literature
- US20220157658A1 WAFER MANUFACTURING METHOD AND LAMINATED DEVICE CHIP MANUFACTURING METHOD Public/Granted day:2022-05-19
Information query
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