- 专利标题: Inductor built-in substrate
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申请号: US17123756申请日: 2020-12-16
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公开(公告)号: US11856699B2公开(公告)日: 2023-12-26
- 发明人: Satoru Kawai , Yasuki Kimishima
- 申请人: IBIDEN CO., LTD.
- 申请人地址: JP Gifu
- 专利权人: IBIDEN CO., LTD.
- 当前专利权人: IBIDEN CO., LTD.
- 当前专利权人地址: JP Ogaki
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP 19228099 2019.12.18
- 主分类号: H01K1/16
- IPC分类号: H01K1/16 ; H05K1/16 ; H05K1/11
摘要:
An inductor built-in substrate includes a core substrate having openings and first through holes formed therein, a magnetic resin filling the openings and having second through holes formed therein, first through-hole conductors formed in the first through holes respectively such that each of the first through-hole conductors includes an electroless plating film and an electrolytic plating film, and second through-hole conductors formed in the second through holes respectively such that each of the second through-hole conductors includes an electroless plating film and an electrolytic plating film. The first through-hole conductors and the second through-hole conductors are formed such that a thickness of the electroless plating film in the first through-hole conductors is larger than a thickness of the electroless plating film in the second through-hole conductors.
公开/授权文献
- US20210195748A1 INDUCTOR BUILT-IN SUBSTRATE 公开/授权日:2021-06-24
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