Invention Grant
- Patent Title: Silicon nitride metal layer covers
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Application No.: US17246561Application Date: 2021-04-30
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Publication No.: US11876056B2Publication Date: 2024-01-16
- Inventor: Jonathan Andrew Montoya , Salvatore Franks Pavone
- Applicant: TEXAS INSTRUMENTS INCORPORATED
- Applicant Address: US TX Dallas
- Assignee: TEXAS INSTRUMENTS INCORPORATED
- Current Assignee: TEXAS INSTRUMENTS INCORPORATED
- Current Assignee Address: US TX Dallas
- Agent Dawn Jos; Frank D. Cimino
- Main IPC: H01L23/00
- IPC: H01L23/00

Abstract:
In some examples, a semiconductor package includes a semiconductor die; a passivation layer abutting a device side of the semiconductor die; a first conductive layer abutting the device side of the semiconductor die; a second conductive layer abutting the first conductive layer and the passivation layer; a silicon nitride layer abutting the second conductive layer, the silicon nitride layer having a thickness ranging from 300 Angstroms to 3000 Angstroms; and a third conductive layer coupled to the second conductive layer at a gap in the silicon nitride layer, the third conductive layer configured to receive a solder ball.
Public/Granted literature
- US20220352098A1 SILICON NITRIDE METAL LAYER COVERS Public/Granted day:2022-11-03
Information query
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