- Patent Title: Method and system for optical characterization of patterned samples
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Application No.: US17135924Application Date: 2020-12-28
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Publication No.: US11885737B2Publication Date: 2024-01-30
- Inventor: Dror Shafir , Gilad Barak , Shay Wolfling , Michal Haim Yachini , Matthew Sendelbach , Cornel Bozdog
- Applicant: NOVA LTD.
- Applicant Address: IL Rehovot
- Assignee: Nova Ltd.
- Current Assignee: Nova Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Reches Patents
- The original application number of the division: US14265771 2014.04.30
- Main IPC: G01N21/21
- IPC: G01N21/21 ; G01N21/47

Abstract:
A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.
Public/Granted literature
- US20210116359A1 METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLES Public/Granted day:2021-04-22
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