Invention Grant
- Patent Title: Ultraviolet light generation target, method for manufacturing ultraviolet light generation target, and electron-beam-excited ultraviolet light source
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Application No.: US17296294Application Date: 2019-12-13
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Publication No.: US11887837B2Publication Date: 2024-01-30
- Inventor: Norio Ichikawa , Kohei Ikeda
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu
- Agency: Faegre Drinker Biddle & Reath LLP
- Priority: JP 18235288 2018.12.17
- International Application: PCT/JP2019/049006 2019.12.13
- International Announcement: WO2020/129856A 2020.06.25
- Date entered country: 2021-05-24
- Main IPC: H01J63/06
- IPC: H01J63/06 ; G01J1/42 ; H01J63/04

Abstract:
An ultraviolet light generation target includes a light emitting layer. The light emitting layer contains a YPO4 crystal to which at least scandium (Sc) is added, and receives an electron beam to generate ultraviolet light. Further, a method of manufacturing the ultraviolet light generation target includes a first step of preparing a mixture containing yttrium (Y) oxide, Sc oxide, phosphoric acid, and a liquid, a second step of evaporating the liquid, and a third step of firing the mixture.
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