发明授权
- 专利标题： Photocurable ink composition for ink jet recording and ink jet recording method
-
申请号： US17232833申请日： 2021-04-16
-
公开(公告)号： US11898042B2公开(公告)日： 2024-02-13
- 发明人: Hiroaki Kida , Hiroshi Fukumoto , Toru Saito , Keitaro Nakano , Hiroki Nakane
- 申请人： SEIKO EPSON CORPORATION
- 申请人地址： JP Tokyo
- 专利权人： Seiko Epson Corporation
- 当前专利权人： Seiko Epson Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： WORKMAN NYDEGGER
- 优先权： JP 11151770 2011.07.08 JP 11200809 2011.09.14 JP 12008704 2012.01.19
- 分案原申请号： US13544539 2012.07.09
- 主分类号： C09D11/101
- IPC分类号： C09D11/101 ; B41J2/21 ; C09D11/38 ; C09D11/322 ; C08K3/013 ; B41J11/00
摘要：
The present invention provides a photocurable ink composition for ink jet recording with excellent curability. The photocurable ink composition for ink jet recording includes polymerizable compounds, a photopolymerization initiator, and a colorant, wherein the polymerizable compounds include a vinyl ether group-containing (meth)acrylate represented by general formula (I):
CH2═CR1—COOR2—O—CH═CH—R3 (I)
(wherein R1 is a hydrogen atom or a methyl group, R2 is a divalent organic residue having 2 to 20 carbon atoms, and R3 is a hydrogen atom or a monovalent organic residue having 1 to 11 carbon atoms) and phenoxyethyl (meth)acrylate.
CH2═CR1—COOR2—O—CH═CH—R3 (I)
(wherein R1 is a hydrogen atom or a methyl group, R2 is a divalent organic residue having 2 to 20 carbon atoms, and R3 is a hydrogen atom or a monovalent organic residue having 1 to 11 carbon atoms) and phenoxyethyl (meth)acrylate.
公开/授权文献
信息查询
IPC分类:
