Invention Grant
- Patent Title: High throughput and metal contamination control oven for chamber component cleaning process
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Application No.: US17187218Application Date: 2021-02-26
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Publication No.: US11898245B2Publication Date: 2024-02-13
- Inventor: Chien-Min Liao , Chi-Feng Liu , Yi Nung Wu , Hsiu Yang , Yixing Lin , Boon Sen Chan , Siamak Salimian
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: MOSER TABOADA
- Main IPC: C23C16/44
- IPC: C23C16/44 ; C23C16/455 ; H05B1/02

Abstract:
Methods and apparatus for a baking chamber for processing a chamber component are provided herein. In some embodiments, a baking chamber includes: an enclosure defining a first chamber, wherein the first chamber comprises: a first chamber body having a first floor and first sidewalls that couple the first floor to a first lid of the first chamber body to define a first interior volume; a first support disposed in the first interior volume; a first gas line disposed in the first interior volume proximate the first lid; a first showerhead disposed between the first gas line and the first support; a first exhaust coupled to the first floor; and a first heater disposed in the first interior volume between the first support and the first floor; and wherein the enclosure includes a door configured to facilitate transferring the chamber component into and out of the enclosure.
Public/Granted literature
- US20220275505A1 HIGH THROUGHPUT AND METAL CONTAMINATION CONTROL OVEN FOR CHAMBER COMPONENT CLEANING PROCESS Public/Granted day:2022-09-01
Information query
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