- 专利标题: Antimicrobial bandage with nanostructures
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申请号: US17132358申请日: 2020-12-23
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公开(公告)号: US11931225B2公开(公告)日: 2024-03-19
- 发明人: Huan Hu , Minhua Lu , Vince Siu , Gustavo Alejandro Stolovitzky
- 申请人: International Business Machines Corporation
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 代理机构: Amin, Turocy & Watson, LLP
- 分案原申请号: US15823637 2017.11.28
- 主分类号: A61F13/00
- IPC分类号: A61F13/00 ; A61F13/02 ; B29C35/02 ; B29C39/26 ; B29C59/02 ; B29C65/48 ; B29L31/00 ; B81C99/00
摘要:
One or more embodiments include antimicrobial bandages with nanostructures, formation thereof, and usage thereof to facilitate wound healing. In one embodiment, a bandage apparatus that facilitates healing a wound is provided. The bandage apparatus includes a substrate having an attachment mechanism that facilitates removably attaching the substrate to a part of a body having the wound. The bandage apparatus also includes a nanostructure film provided on a surface of the substrate and configured to contact the wound when the substrate is attached to the part of the body having the wound, wherein the nanostructure film includes a plurality of nanostructures.
公开/授权文献
- US20210145647A1 ANTIMICROBIAL BANDAGE WITH NANOSTRUCTURES 公开/授权日:2021-05-20
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