发明授权
- 专利标题: Examination device
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申请号: US17285557申请日: 2019-10-07
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公开(公告)号: US11946858B2公开(公告)日: 2024-04-02
- 发明人: Yoshihiro Satou , Toshio Masuda , Hitoshi Matsuno , Kei Shibayama , Osamu Yoshimura , Yuichirou Iijima
- 申请人: HITACHI HIGH-TECH CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: HITACHI HIGH-TECH CORPORATION
- 当前专利权人: HITACHI HIGH-TECH CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: MATTINGLY & MALUR, PC
- 优先权: JP 18209474 2018.11.07
- 国际申请: PCT/JP2019/039433 2019.10.07
- 国际公布: WO2020/095594A 2020.05.14
- 进入国家日期: 2021-04-15
- 主分类号: G01N21/15
- IPC分类号: G01N21/15 ; G01N21/95
摘要:
The purpose of the present invention is to allow a clean airflow around a substrate to reliably move downward of the substrate in an examination device in which clean air is supplied to an inspection chamber. This examination device is provided with a rectifying plate (see FIG. 4A) which covers a part of the upper surface of a stage for mounting a substrate, and is disposed between a gas supply unit and the stage to block an airflow toward the substrate.
公开/授权文献
- US20210404946A1 EXAMINATION DEVICE 公开/授权日:2021-12-30
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