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公开(公告)号：US11946858B2
公开(公告)日：2024-04-02
申请号：US17285557
申请日：2019-10-07
发明人： Yoshihiro Satou , Toshio Masuda , Hitoshi Matsuno , Kei Shibayama , Osamu Yoshimura , Yuichirou Iijima
CPC分类号： G01N21/15 , G01N21/9501 , G01N2021/151
摘要： The purpose of the present invention is to allow a clean airflow around a substrate to reliably move downward of the substrate in an examination device in which clean air is supplied to an inspection chamber. This examination device is provided with a rectifying plate (see FIG. 4A) which covers a part of the upper surface of a stage for mounting a substrate, and is disposed between a gas supply unit and the stage to block an airflow toward the substrate.
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