- 专利标题： Backpressure monitoring apparatus
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申请号： US17537807申请日： 2021-11-30
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公开(公告)号： US11953390B2公开(公告)日： 2024-04-09
- 发明人: Sukti Chatterjee , David Masayuki Ishikawa , Yuriy V. Melnik , David A. Britz , Lance A. Scudder
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Kilpatrick Townsend & Stockton LLP
- 主分类号： G01L13/00
- IPC分类号： G01L13/00 ; B05B12/00 ; G01F1/34
摘要：
Exemplary backpressure monitoring apparatuses may include a fluid supply source having a fluid port. The backpressure monitoring apparatuses may include a flow control mechanism fluidly coupled with the fluid port. The backpressure monitoring apparatuses may include a delivery tube fluidly coupled with the flow control mechanism and the fluid port. The backpressure monitoring apparatuses may include a pressure differential gauge fluidly coupled with the delivery tube. The pressure differential gauge may include an interface mechanism that is engageable with an outlet of a fluid flow device.
公开/授权文献
- US20230168139A1 BACKPRESSURE MONITORING APPARATUS 公开/授权日：2023-06-01
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