Invention Grant
- Patent Title: Backpressure monitoring apparatus
-
Application No.: US17537807Application Date: 2021-11-30
-
Publication No.: US11953390B2Publication Date: 2024-04-09
- Inventor: Sukti Chatterjee , David Masayuki Ishikawa , Yuriy V. Melnik , David A. Britz , Lance A. Scudder
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: G01L13/00
- IPC: G01L13/00 ; B05B12/00 ; G01F1/34

Abstract:
Exemplary backpressure monitoring apparatuses may include a fluid supply source having a fluid port. The backpressure monitoring apparatuses may include a flow control mechanism fluidly coupled with the fluid port. The backpressure monitoring apparatuses may include a delivery tube fluidly coupled with the flow control mechanism and the fluid port. The backpressure monitoring apparatuses may include a pressure differential gauge fluidly coupled with the delivery tube. The pressure differential gauge may include an interface mechanism that is engageable with an outlet of a fluid flow device.
Public/Granted literature
- US20230168139A1 BACKPRESSURE MONITORING APPARATUS Public/Granted day:2023-06-01
Information query