- 专利标题: Manufacturing method of silicon carbide wafer, silicon carbide wafer and system for manufacturing wafer
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申请号: US17575999申请日: 2022-01-14
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公开(公告)号: US11969917B2公开(公告)日: 2024-04-30
- 发明人: Jung-Gyu Kim , Kap-Ryeol Ku , Jung Doo Seo , Jung Woo Choi , Jong Hwi Park
- 申请人: SENIC Inc.
- 申请人地址: KR Cheonan-si
- 专利权人: SENIC Inc.
- 当前专利权人: SENIC Inc.
- 当前专利权人地址: KR Cheonan-si
- 代理机构: NSIP Law
- 优先权: KR 20210005463 2021.01.14
- 主分类号: B32B3/00
- IPC分类号: B32B3/00 ; B28D5/00 ; B28D5/04
摘要:
A silicon carbide wafer manufacturing method includes: a bending measuring step of measuring a first edge having the greatest degree of a bending at one surface of a silicon carbide ingot having one surface; a cutting start step of starting a cutting at a second edge having a distance of r×a along an edge of the one surface from the first edge in a direction parallel to or with a predetermined off angle with respect to the one surface through the wire saw, a cutting speed being decreased to a first cutting speed in the cutting start step; a cutting proceeding step in which the first cutting speed is substantially constant within a variation of about ±5% of the first cutting speed; and a finish step in which the cutting speed is increased from the first cutting speed and the cutting of the silicon carbide ingot is completed.
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