- 专利标题: Method for particle analysis and method for particle production
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申请号: US16858432申请日: 2020-04-24
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公开(公告)号: US11988636B2公开(公告)日: 2024-05-21
- 发明人: Makoto Kawano , Ayako Tatematsu , Ryosuke Abe
- 申请人: KAWANO Lab. Inc. , TableMark Co., Ltd.
- 申请人地址: JP Osaka
- 专利权人: KAWANO Lab. Inc.,TableMark Co., Ltd.
- 当前专利权人: KAWANO Lab. Inc.,TableMark Co., Ltd.
- 当前专利权人地址: JP Osaka; JP Tokyo
- 代理机构: Studebaker & Brackett PC
- 主分类号: G01N27/76
- IPC分类号: G01N27/76 ; A23L27/00 ; A23P10/30 ; B01J13/02 ; G01N15/00 ; G01N15/10 ; G01N15/1031 ; B01J13/04
摘要:
The method for particle analysis includes a first magnetic susceptibility measurement step S4 of measuring a volume magnetic susceptibility of each of first particles p1; an encapsulation treatment step S5 of performing an encapsulation treatment so that the first particles p1 encapsulate an encapsulation target component pt smaller than the first particles p1; a second magnetic susceptibility measurement step S8 of measuring a volume magnetic susceptibility of each of second particles p2 as an analysis target that are the first particles p1 after the encapsulation treatment; and a step S9 of analyzing whether or not the encapsulation target component pt is encapsulated in the second particles p2 based on a result of measurement in the first magnetic susceptibility measurement step S4 and a result of measurement in the second magnetic susceptibility measurement step S8.
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