Invention Grant
- Patent Title: High-frequency power supply system
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Application No.: US18086406Application Date: 2022-12-21
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Publication No.: US11990317B2Publication Date: 2024-05-21
- Inventor: Yuichi Hasegawa
- Applicant: DAIHEN CORPORATION
- Applicant Address: JP Osaka
- Assignee: DAIHEN CORPORATION
- Current Assignee: DAIHEN CORPORATION
- Current Assignee Address: JP Osaka-Fu
- Agency: Crowell & Moring LLP
- Priority: JP 21214221 2021.12.28
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
To simplify a process of suppressing an increase in a reflected wave power caused by IMD, provided is a high-frequency power supply system for providing a high-frequency power to a load, including: a first power supply for supplying a first high-frequency power to the load; a second power supply for supplying a second high-frequency power to the load; and a matching device. The matching device provides a system clock to each of the first power supply and the second power supply. The second power supply outputs a second high-frequency voltage at a control period determined based on the system clock provided from the matching device. The first power supply outputs a first high-frequency voltage obtained by frequency modulation of a fundamental wave signal having a first fundamental frequency and through amplification, in each control period determined based on the system clock provided from the matching device.
Public/Granted literature
- US20230207264A1 HIGH-FREQUENCY POWER SUPPLY SYSTEM Public/Granted day:2023-06-29
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