- 专利标题: Gas distribution ceramic heater for deposition chamber
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申请号: US17106735申请日: 2020-11-30
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公开(公告)号: US12016092B2公开(公告)日: 2024-06-18
- 发明人: Pingyan Lei , Dien-Yeh Wu , Jallepally Ravi , Manjunatha Koppa , Ambarish Toorihal , Sandesh Yadamane , Vinod Konda Purathe , Xiaoxiong Yuan
- 申请人: APPLIED MATERIALS, INC.
- 申请人地址: US CA Santa Clara
- 专利权人: APPLIED MATERIALS, INC.
- 当前专利权人: APPLIED MATERIALS, INC.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: MOSER TABOADA
- 主分类号: H05B3/48
- IPC分类号: H05B3/48 ; C23C14/54 ; C23C16/455 ; C23C16/458 ; H05B3/14
摘要:
Embodiments of a lid heater for a deposition chamber are provided herein. In some embodiments, a lid heater for a deposition chamber includes a ceramic heater body having a first side opposite a second side, wherein the ceramic heater body includes a first plurality of gas channels extending from one or more first gas inlets on the first side, wherein each of the one or more first gas inlets extend to a plurality of first gas outlets on the second side; a heating element embedded in the ceramic heater body; and an RF electrode embedded in the ceramic heater body proximate the second side, wherein the first plurality of gas channels extend through the RF electrode.
公开/授权文献
- US20210176831A1 GAS DISTRIBUTION CERAMIC HEATER FOR DEPOSITION CHAMBER 公开/授权日:2021-06-10
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