- 专利标题: Roughened nickel-plated material and method for manufacturing same
-
申请号: US17630274申请日: 2020-07-27
-
公开(公告)号: US12018395B2公开(公告)日: 2024-06-25
- 发明人: Shinichirou Horie , Etsuro Tsutsumi , Toshifumi Koyanagi , Shunki Obata , Michio Kawamura , Koh Yoshioka , Naoharu Harada , Tsuyoshi Irie , Yonosuke Yoshii
- 申请人: TOYO KOHAN CO., LTD.
- 申请人地址: JP Tokyo
- 专利权人: TOYO KOHAN CO., LTD.
- 当前专利权人: TOYO KOHAN CO., LTD.
- 当前专利权人地址: JP Tokyo
- 代理机构: Browdy and Neimark, P.L.L.C.
- 优先权: JP 19138340 2019.07.26 JP 20008792 2020.01.22
- 国际申请: PCT/JP2020/028684 2020.07.27
- 国际公布: WO2021/020338A 2021.02.04
- 进入国家日期: 2022-01-26
- 主分类号: C25D3/12
- IPC分类号: C25D3/12 ; C25D5/00 ; C25D5/48
摘要:
[Object]
To provide a roughened nickel-plated material in which the formation unevenness such as generation of the unevenness or grooves in a roughened nickel plated layer is restrained.
[Solving Means]
A roughened nickel-plated material including a base material that is a rolled material, and a roughened nickel plated layer formed on at least one surface of the base material, in which SRzjis of the surface of the roughened nickel plated layer is equal to or more than 2 μm, and, letting a maximum height of the roughened nickel plated layer be SRz, a valley region B in a given virtual planer region A as observed at a height position of SRz×0.25 satisfies the following (i). (i) The length of the valley region B in the rolling direction RD of the base material is less than 40 μm in a direct distance.
To provide a roughened nickel-plated material in which the formation unevenness such as generation of the unevenness or grooves in a roughened nickel plated layer is restrained.
[Solving Means]
A roughened nickel-plated material including a base material that is a rolled material, and a roughened nickel plated layer formed on at least one surface of the base material, in which SRzjis of the surface of the roughened nickel plated layer is equal to or more than 2 μm, and, letting a maximum height of the roughened nickel plated layer be SRz, a valley region B in a given virtual planer region A as observed at a height position of SRz×0.25 satisfies the following (i). (i) The length of the valley region B in the rolling direction RD of the base material is less than 40 μm in a direct distance.
公开/授权文献
信息查询