- 专利标题: In-situ monitoring system assisted material and parameter development for additive manufacturing
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申请号: US17967391申请日: 2022-10-17
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公开(公告)号: US12023860B2公开(公告)日: 2024-07-02
- 发明人: Vipul Kumar Gupta , Natarajan Chennimalai Kumar , Anthony Joseph Vinciquerra , Laura Cerully Dial , Voramon Supatarawanich Dheeradhada , Timothy Hanlon , Lembit Salasoo , Xiaohu Ping , Subhrajit Roychowdhury , Justin John Gambone
- 申请人: General Electric Company
- 申请人地址: US NY Schenectady
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: US NY Schenectady
- 代理机构: Hanley, Flight & Zimmerman, LLC
- 主分类号: B29C64/153
- IPC分类号: B29C64/153 ; B22F10/20 ; B22F10/31 ; B22F10/85 ; B29C64/393 ; B33Y50/00 ; B22F3/24 ; B22F10/28 ; B22F10/30 ; B22F10/366 ; B22F12/90 ; B33Y10/00 ; B33Y30/00 ; B33Y40/00 ; B33Y50/02
摘要:
According to some embodiments, system and methods are provided comprising receiving, via a communication interface of a parameter development module comprising a processor, a defined geometry for one or more parts, wherein the parts are manufactured with an additive manufacturing machine, and wherein a stack is formed from one or more parts; fabricating the one or more parts with the additive manufacturing machine based on a first parameter set; collecting in-situ monitoring data from one or more in-situ monitoring systems of the additive manufacturing machine for one or more parts; determining whether each stack should receive an additional part based on an analysis of the collected in-situ monitoring data; and fabricating each additional part based on the determination the stack should receive the additional part. Numerous other aspects are provided.
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