The present invention particularly relates to a method for physical vacuum deposition of a coating (R) comprising at least one material (M) on at least a portion of a front face (10) of a support (1), said at least one material (M) originating from an evaporation source or an atomisation source (2), wherein: —use is made of a support (1), at least a portion of the front face (10) of which is smooth, that is to say, does not have any roughness and/or reliefs and/or recesses; —said vacuum deposition is carried out while varying the thickness distribution of the material (M) on said front face (10), that is, while progressively varying the thickness deposited, from a central region (11) in the direction of at least one lateral region (12) contiguous to the central region (11), without modifying the position of the evaporation source or atomisation source (2) of the material particles (M).