Invention Grant
- Patent Title: Holographic microscope and manufacturing method of semiconductor device using the same
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Application No.: US17060526Application Date: 2020-10-01
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Publication No.: US12038718B2Publication Date: 2024-07-16
- Inventor: Seungbeom Park , Sungmin Park , Jaehyeon Son , Heejun Ahn , Myungjun Lee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR 20190179800 2019.12.31
- Main IPC: G03H1/00
- IPC: G03H1/00 ; G01N21/95 ; G02B21/00 ; G03H1/04 ; G03H1/16 ; H01L21/66

Abstract:
Provided is a holographic microscope including an input optical system configured to emit polarized input beam, a first beam splitter configured to emit an object beam by reflecting a portion of the polarized input beam, and emit a reference beam by transmitting a remaining portion of the polarized input beam, a reference optical system configured to separate the reference beam into a first reference beam and a second reference beam, a camera configured to receive the first reference beam and the second reference beam and the object beam that is reflected by an inspection object, the camera including a micro polarizer array, wherein a first polarization axis of the first reference beam is perpendicular to a second polarization axis of the second reference beam.
Public/Granted literature
- US20210200148A1 HOLOGRAPHIC MICROSCOPE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME Public/Granted day:2021-07-01
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