Invention Grant
- Patent Title: Methods for forming microwave tunable composited thin-film dielectric layer
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Application No.: US16427723Application Date: 2019-05-31
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Publication No.: US12048948B2Publication Date: 2024-07-30
- Inventor: Yueh Sheng Ow , Yue Cui , Arvind Sundarrajan , Nuno Yen-Chu Chen , Guan Huei See , Felix Deng
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboa
- Main IPC: B05D3/06
- IPC: B05D3/06 ; H01L23/00 ; H01P3/08 ; H01P11/00

Abstract:
Methods of curing a polymer layer on a substrate using variable microwave frequency are provided herein. In some embodiments, methods of curing a polymer layer on a substrate using variable microwave frequency include (a) forming a first thin-film polymer layer on a substrate, the first thin-film polymer layer including at least one first base dielectric material and at least one microwave tunable material, (b) applying a variable frequency microwave energy to the substrate and the first thin-film polymer layer to heat the substrate and the first thin-film polymer layer to a first temperature, and (c) adjusting the variable frequency microwave energy applied to the substrate and the first thin-film polymer layer to tune at least one material property of the first thin-film polymer layer.
Public/Granted literature
- US20200206775A1 METHODS FOR FORMING MICROWAVE TUNABLE COMPOSITED THIN-FILM DIELECTRIC LAYER Public/Granted day:2020-07-02
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