Invention Grant
- Patent Title: Situ clean for bevel and edge ring
-
Application No.: US17829288Application Date: 2022-05-31
-
Publication No.: US12068153B2Publication Date: 2024-08-20
- Inventor: Kaushik Alayavalli , Andrew Nguyen , Edward Haywood , Lu Liu , Malav Kapadia
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01J21/02
- IPC: H01J21/02 ; H01J37/32 ; H01L21/02
Abstract:
Embodiments disclosed herein include a method for cleaning a bevel area of a substrate support disposed within a plasma processing chamber. In one example the method begins by placing a cover substrate on a substrate support disposed in an interior volume of a processing chamber. A cleaning gas is provided into the interior volume of the processing chamber. A plasma is struck in the interior volume of the processing chamber. A cleaning gas is provided through the substrate support to a bevel edge area defined between an outer diameter of the cover substrate and an edge ring disposed on the substrate support.
Public/Granted literature
- US20230386823A1 SITU CLEAN FOR BEVEL AND EDGE RING Public/Granted day:2023-11-30
Information query
