Invention Grant
- Patent Title: Plasma aerosol device
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Application No.: US17123084Application Date: 2020-12-15
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Publication No.: US12069792B2Publication Date: 2024-08-20
- Inventor: Guan-Heng Lyu , Ying-Hung Chen , Ping-Yen Hsieh , Tsung-Han Chen , Chu-Liang Ho
- Applicant: Feng Chia University
- Applicant Address: TW Taichung
- Assignee: FENG CHIA UNIVERSITY
- Current Assignee: FENG CHIA UNIVERSITY
- Current Assignee Address: TW Taichung
- Agent Cheng-Ju Chiang
- Priority: TW 9132994 2020.09.23
- Main IPC: H05H1/24
- IPC: H05H1/24 ; A61L2/14

Abstract:
The present invention discloses that a plasma aerosol device includes a gas tunnel, a dielectric barrier discharge module, and a liquid tunnel. The invention uses a mechanism similar to a dielectric barrier discharge (DBD) electrode system, thus to enable generating a plasma active water mist which riches in free radicals such as reactive nitrogen species (RNS) and reactive oxygen species (ROS). Therefore, this invention is able to be used in medical, sterilization, agriculture and preservation industries.
Public/Granted literature
- US20220095444A1 PLASMA AEROSOL DEVICE Public/Granted day:2022-03-24
Information query
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