- 专利标题: Systems, devices, and methods for high quality ion beam formation
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申请号: US17984954申请日: 2022-11-10
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公开(公告)号: US12070625B2公开(公告)日: 2024-08-27
- 发明人: Alexander Dunaevsky , Artem N. Smirnov , Alexandr A. Ivanov , Vladislav Vekselman
- 申请人: TAE TECHNOLOGIES, INC.
- 申请人地址: US CA Foothill Ranch
- 专利权人: TAE TECHNOLOGIES, INC.
- 当前专利权人: TAE TECHNOLOGIES, INC.
- 当前专利权人地址: US CA Foothill Ranch
- 代理机构: ALSTON & BIRD LLP
- 主分类号: A61N5/10
- IPC分类号: A61N5/10 ; H05H5/03 ; H05H5/06
摘要:
Embodiments of systems, devices, and methods relate to a beam system. An example beam system includes a charged particle source configured to generate a beam of charged particles, a pre-accelerator system configured to accelerate the beam, and an accelerator configured to accelerate the beam from the pre-accelerator system. The pre-accelerator system can cause the beam to converge as it is propagated from the source to an input aperture of the accelerator. The pre-accelerator system can further reduce or eliminate source disturbance or damage caused by backflow traveling from the accelerator toward the source.
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