Invention Grant
- Patent Title: Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source
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Application No.: US17737061Application Date: 2022-05-05
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Publication No.: US12077849B2Publication Date: 2024-09-03
- Inventor: Bassam Hanna Abraham , Roman Chistyakov
- Applicant: IonQuest Corp.
- Applicant Address: US MA Milford
- Assignee: IonQuest Corp.
- Current Assignee: IonQuest Corp.
- Current Assignee Address: US MA Milford
- Agency: FisherBroyles, LLP
- Main IPC: C23C14/35
- IPC: C23C14/35 ; C23C14/34 ; H01J37/34 ; H01L21/285

Abstract:
A method of depositing a layer on a substrate includes applying a first magnetic field to a cathode target, electrically coupling the cathode target to a first high power pulse resonance alternating current (AC) power supply, positioning an additional cylindrical cathode target electrode around the cathode, applying a second magnetic field to the additional cylindrical cathode target electrode, electrically coupling the additional cylindrical cathode target electrode to a second high power pulse resonance AC power supply, generating magnetic coupling between the cathode target and an anode, providing a feed gas, and selecting a time shift between negative voltage peaks associated with AC voltage waveforms generated by the first high power pulse resonance AC power supply and the second high power pulse resonance AC power supply. An apparatus includes a vacuum chamber, cathode target magnet assembly, first high power pulse resonance AC power supply, additional electrode, additional electrode magnet assembly, second high power pulse resonance AC power supply, and feed gas.
Public/Granted literature
- US20220259719A1 ELECTRICALLY AND MAGNETICALLY ENHANCED IONIZED PHYSICAL VAPOR DEPOSITION UNBALANCED SPUTTERING SOURCE Public/Granted day:2022-08-18
Information query
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