Invention Grant
- Patent Title: Detecting an excursion of a CMP component using time-based sequence of images
-
Application No.: US17678936Application Date: 2022-02-23
-
Publication No.: US12079984B2Publication Date: 2024-09-03
- Inventor: Sidney P. Huey , Thomas Li , Benjamin Cherian
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: G06T7/00
- IPC: G06T7/00 ; B24B37/005 ; G06T7/20 ; H04N5/272 ; H04N7/18 ; H01L21/306 ; H01L21/3105 ; H01L21/66

Abstract:
Monitoring operations of a polishing system includes obtaining a time-based sequence of reference images of a component of the polishing system performing operations during a test operation of the polishing system, receiving from a camera a time-based sequence of monitoring images of an equivalent component of an equivalent polishing system performing operations during polishing of a substrate, determining a difference value for the time-based sequence of monitoring images by comparing the time-based sequence of reference images to the time-based sequence of monitoring image using an image processing algorithm, determining whether the difference value exceeds a threshold, and in response to determining the difference value exceeds the threshold, indicating an excursion.
Public/Granted literature
- US20220284560A1 DETECTING AN EXCURSION OF A CMP COMPONENT USING TIME-BASED SEQUENCE OF IMAGES Public/Granted day:2022-09-08
Information query