Invention Grant
- Patent Title: Machine learning using a global texture characteristic for semiconductor-based applications
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Application No.: US17557014Application Date: 2021-12-20
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Publication No.: US12080050B2Publication Date: 2024-09-03
- Inventor: David Kucher , Sophie Salomon , Vijay Ramachandran
- Applicant: KLA Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA Corp.
- Current Assignee: KLA Corp.
- Current Assignee Address: US CA Milpitas
- Agent Ann Marie Mewherter
- Main IPC: G06V10/77
- IPC: G06V10/77 ; G06N3/063 ; G06T5/50 ; G06T7/194 ; G06T7/73 ; G06V10/54 ; G06V10/82

Abstract:
Methods and systems for determining information for a specimen are provided. One system includes a computer subsystem configured for determining a global texture characteristic of an image of a specimen and one or more local characteristics of a localized area in the image. The system also includes one or more components executed by the computer subsystem. The component(s) include a machine learning model configured for determining information for the specimen based on the global texture characteristic and the one or more local characteristics. The computer subsystem is also configured for generating results including the determined information. The methods and systems may be used for metrology (in which the determined information includes one or more characteristics of a structure formed on the specimen) or inspection (in which the determined information includes a classification of a defect detected on the specimen).
Public/Granted literature
- US20230196732A1 MACHINE LEARNING USING A GLOBAL TEXTURE CHARACTERISTIC FOR SEMICONDUCTOR-BASED APPLICATIONS Public/Granted day:2023-06-22
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