Machine learning using a global texture characteristic for semiconductor-based applications
Abstract:
Methods and systems for determining information for a specimen are provided. One system includes a computer subsystem configured for determining a global texture characteristic of an image of a specimen and one or more local characteristics of a localized area in the image. The system also includes one or more components executed by the computer subsystem. The component(s) include a machine learning model configured for determining information for the specimen based on the global texture characteristic and the one or more local characteristics. The computer subsystem is also configured for generating results including the determined information. The methods and systems may be used for metrology (in which the determined information includes one or more characteristics of a structure formed on the specimen) or inspection (in which the determined information includes a classification of a defect detected on the specimen).
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