Invention Grant
- Patent Title: Low temperature deposition of pure molybdenum films
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Application No.: US18379515Application Date: 2023-10-12
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Publication No.: US12080558B2Publication Date: 2024-09-03
- Inventor: Kunal Bhatnagar , Dmitrii Leshchev , Mohith Verghese , Jose Alexandro Romero
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- The original application number of the division: US17183474 2021.02.24
- Main IPC: H01L21/285
- IPC: H01L21/285 ; C23C16/14 ; C23C16/44 ; C23C16/455
Abstract:
Methods for depositing molybdenum films on a substrate are described. The substrate is exposed to a molybdenum halide precursor and an aluminum precursor to form the molybdenum film (e.g., elemental molybdenum) at a low temperature. The exposures can be sequential or simultaneous.
Public/Granted literature
- US20240047215A1 LOW TEMPERATURE DEPOSITION OF PURE MOLYBENUM FILMS Public/Granted day:2024-02-08
Information query
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