Invention Grant
- Patent Title: Method for producing optical element and optical element
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Application No.: US17226721Application Date: 2021-04-09
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Publication No.: US12099296B2Publication Date: 2024-09-24
- Inventor: Soh Uenoyama , Hiroki Kamei , Kazuyoshi Hirose
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu
- Agency: Faegre Drinker Biddle & Reath LLP
- Priority: JP 20071534 2020.04.13
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G02B27/00

Abstract:
A method for producing an optical element includes: forming a resist layer on a main surface of a substrate; forming a pattern region in the resist layer; forming a groove; forming a dielectric layer covering the pattern region; and forming an optical functional portion. The pattern region is formed in the resist layer. The groove is formed in a portion corresponding to a periphery of the pattern region as viewed in a direction orthogonal to the main surface. A dielectric is deposited to form the dielectric layer. After the dielectric layer covering the pattern region is formed, the resist layer is removed to form the optical functional portion at a position where the pattern region is disposed on the main surface. The optical functional portion is made of the dielectric.
Public/Granted literature
- US20210318611A1 METHOD FOR PRODUCING OPTICAL ELEMENT AND OPTICAL ELEMENT Public/Granted day:2021-10-14
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