- 专利标题： Inductor structure and manufacturing method for the same
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申请号： US17234891申请日： 2021-04-20
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公开(公告)号： US12131863B2公开(公告)日： 2024-10-29
- 发明人: Erh-Kun Lai , Hsiang-Lan Lung
- 申请人： MACRONIX INTERNATIONAL CO., LTD.
- 申请人地址： TW Hsinchu
- 专利权人： MACRONIX INTERNATIONAL CO., LTD.
- 当前专利权人： MACRONIX INTERNATIONAL CO., LTD.
- 当前专利权人地址： TW Hsinchu
- 代理机构： McClure, Qualey & Rodack, LLP
- 主分类号： H01F27/28
- IPC分类号： H01F27/28 ; H01F27/32 ; H01F41/12 ; H01L49/02
摘要：
An inductor structure and a manufacturing method for the same are provided. The inductor structure includes conductive layers and conductive elements. The conductive layers overlap in a vertical direction. Each of the conductive elements is coupled between two conductive layers of the conductive layers.
公开/授权文献
- US20220336145A1 INDUCTOR STRUCTURE AND MANUFACTURING METHOD FOR THE SAME 公开/授权日：2022-10-20
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