Invention Grant
- Patent Title: Apparatus and method for controlling substrate thickness
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Application No.: US16977975Application Date: 2019-03-05
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Publication No.: US12151962B2Publication Date: 2024-11-26
- Inventor: Anatoli Anatolyevich Abramov , Anping Liu , Michael Yoshiya Nishimoto , William Anthony Whedon , Jae Hyun Yu
- Applicant: CORNING INCORPORATED
- Applicant Address: US NY Corning
- Assignee: CORNING INCORPORATED
- Current Assignee: CORNING INCORPORATED
- Current Assignee Address: US NY Corning
- Agent Ryan T. Hardee; Grant A. Gildehaus
- International Application: PCT/US2019/020781 WO 20190305
- International Announcement: WO2019/173358 WO 20190912
- Main IPC: C03B17/06
- IPC: C03B17/06 ; G02B26/02 ; G02B27/09

Abstract:
A control apparatus for controlling a thickness of a substrate, such as a glass ribbon. The control apparatus comprises a laser assembly and a shielding assembly. The laser assembly generates an elongated laser beam traveling in a propagation direction along an optical path. The shielding assembly comprises at least one shield selectively disposed in the optical path. The shield is configured to decrease an optical intensity of a region of the elongated laser beam. The shielding assembly is configured to change an intensity profile of the elongated laser beam from an initial intensity profile to a targeted intensity profile. A desired targeted intensity profile can be dictated by an arrangement of the shield(s) relative to the optical path, and can be selected to affect a temperature change at portions of the substrate determined to benefit from a reduction in thickness.
Public/Granted literature
- US20210053858A1 APPARATUS AND METHOD FOR CONTROLLING SUBSTRATE THICKNESS Public/Granted day:2021-02-25
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