Invention Grant
- Patent Title: Monitoring system and method for verifying measurements in patterned structures
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Application No.: US17453338Application Date: 2021-11-02
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Publication No.: US12152869B2Publication Date: 2024-11-26
- Inventor: Boaz Brill , Boris Sherman , Igor Turovets
- Applicant: NOVA LTD.
- Applicant Address: IL Rehovot
- Assignee: NOVA LTD.
- Current Assignee: NOVA LTD.
- Current Assignee Address: IL Rehovot
- Agency: Reches Patents
- Main IPC: G01B11/02
- IPC: G01B11/02 ; G01N21/95 ; G03F7/00 ; H01L21/66

Abstract:
A method and system are presented for monitoring measurement of parameters of patterned structures based on a predetermined fitting model. The method comprises: (a) providing data indicative of measurements in at least one patterned structure; and (b) applying at least one selected verification mode to said data indicative of measurements, said at least one verification mode comprising: I) analyzing the data based on at least one predetermined factor and classifying the corresponding measurement result as acceptable or unacceptable, II) analyzing the data corresponding to the unacceptable measurement results and determining whether one or more of the measurements providing said unacceptable result are to be disregarded, or whether one or more parameters of the predetermined fitting model are to be modified.
Public/Granted literature
- US20220163320A1 Monitoring system and method for verifying measurements in pattened structures Public/Granted day:2022-05-26
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