Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
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Application No.: US18164554Application Date: 2023-02-03
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Publication No.: US12176299B2Publication Date: 2024-12-24
- Inventor: Yu-Wei Lin , Chun-Yen Lan , Tzu-Ting Chou , Tzu-Shiun Sheu , Chih-Wei Lin , Shih-Peng Tai , Wei-Cheng Wu , Ching-Hua Hsieh
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: H01L23/16
- IPC: H01L23/16 ; H01L21/48 ; H01L23/00 ; H01L23/367 ; H01L23/538

Abstract:
A semiconductor device includes a circuit substrate, a semiconductor package, and a package frame. The semiconductor package is disposed on the circuit substrate. The package frame is disposed over the circuit substrate. The package frame encircles the semiconductor package. The semiconductor package has a first surface facing the circuit substrate and a second surface opposite to the first surface. The package frame leaves exposed at least a portion of the second surface of the semiconductor package. The package frame forms a cavity, which cavity encircles the semiconductor package.
Public/Granted literature
- US20230187383A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2023-06-15
Information query
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