Invention Grant
- Patent Title: Film forming position misalignment correction method and film forming system
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Application No.: US18339920Application Date: 2023-06-22
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Publication No.: US12180580B2Publication Date: 2024-12-31
- Inventor: Atsushi Takeuchi , Kazunaga Ono , Kanto Nakamura , Atsushi Gomi
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Fenwick & West LLP
- Priority: JP2022-108677 20220705
- Main IPC: C23C14/34
- IPC: C23C14/34 ; C23C14/04 ; C23C14/54 ; H01J37/34 ; H01J37/32

Abstract:
There is provided a film forming position misalignment correction method comprising: replacing a shielding member; loading a substrate into a film forming module by a transfer mechanism and forming a film on the substrate; detecting an amount of film forming position misalignment by transferring the substrate on which the film has been formed to a film thickness measuring device; correcting a transfer position of the substrate for the transfer mechanism; and checking the correction by transferring the substrate used for measuring the amount of film forming position misalignment to the film forming module by the transfer mechanism for which the transfer position has been corrected to form a film and determining the amount of film forming position misalignment by measuring a film thickness of the formed film by the film thickness measuring device in the same manner.
Public/Granted literature
- US20240011148A1 FILM FORMING POSITION MISALIGNMENT CORRECTION METHOD AND FILM FORMING SYSTEM Public/Granted day:2024-01-11
Information query
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