Invention Grant
- Patent Title: Measurement system, measurement method, and plasma processing device
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Application No.: US17760182Application Date: 2021-01-29
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Publication No.: US12211676B2Publication Date: 2025-01-28
- Inventor: Ayuta Suzuki , Hidefumi Matsui , Atsushi Kubo
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Fenwick & West LLP
- Priority: JP2020-021614 20200212
- International Application: PCT/JP2021/003205 WO 20210129
- International Announcement: WO2021/161804 WO 20210819
- Main IPC: H01J37/32
- IPC: H01J37/32 ; G01J5/00

Abstract:
A measurement system including an imaging device and a plasma processing device having a plasma generator configured to generate plasma from a gas supplied into a processing chamber and a controller. The imaging device is configured to generate optical information of the plasma from image data of imaged plasma in the processing chamber, and the controller is configured to convert the generated optical information of the plasma into a plasma parameter that determines physical characteristics of the plasma with reference to a storage that stores correlation information between the optical information of the plasma and measurement results of the plasma parameter.
Public/Granted literature
- US20230062662A1 MEASUREMENT SYSTEM, MEASUREMENT METHOD, AND PLASMA PROCESSING DEVICE Public/Granted day:2023-03-02
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