Invention Grant
- Patent Title: Coating method and coating apparatus
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Application No.: US17623392Application Date: 2020-06-25
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Publication No.: US12216406B2Publication Date: 2025-02-04
- Inventor: Yusaku Hashimoto , Masatoshi Kawakita , Kosuke Yoshihara
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2019-125439 20190704
- International Application: PCT/JP2020/024990 WO 20200625
- International Announcement: WO2021/002269 WO 20210107
- Main IPC: B05D1/00
- IPC: B05D1/00 ; B05B12/04 ; B05B13/02 ; B05D1/40 ; G03F7/16

Abstract:
A coating method of supplying a treatment solution to a substrate and coating the substrate with the treatment solution by a spin coating method. The method includes mixing a solvent for the treatment solution lower in surface tension than the treatment solution into the treatment solution concurrently with a start of supply of the treatment solution or later than the start of the supply of the treatment solution, and then supplying the treatment solution to the substrate.
Public/Granted literature
- US20220371047A1 COATING METHOD AND COATING APPARATUS Public/Granted day:2022-11-24
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