Invention Grant
- Patent Title: Method for cleaning quartz epitaxial chambers
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Application No.: US16888423Application Date: 2020-05-29
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Publication No.: US12252785B2Publication Date: 2025-03-18
- Inventor: Gregory Deye , Joseph P. Margetis , John Tolle
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer L.L.P.
- Main IPC: C23C16/44
- IPC: C23C16/44 ; H01L21/02
Abstract:
A method of cleaning an epitaxial reaction chamber in-situ is disclosed. The method may include a pre-coating step, a high temperature baking step, and a gas etching step. The method is able to remove residue buildup within the reaction chamber, which may be made of quartz.
Information query
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