Invention Grant
- Patent Title: Numerically compensating SEM-induced charging using diffusion-based model
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Application No.: US17636344Application Date: 2020-08-15
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Publication No.: US12255042B2Publication Date: 2025-03-18
- Inventor: Thomas Jarik Huisman , Shakeeb Bin Hasan
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: EP19192198 20190819
- International Application: PCT/EP2020/072941 WO 20200815
- International Announcement: WO2021/032652 WO 20210225
- Main IPC: H01J37/28
- IPC: H01J37/28 ; G06T5/70 ; H01J37/22
Abstract:
Systems and methods for image enhancement are disclosed. A method for enhancing an image may include acquiring a scanning electron microscopy (SEM) image. The method may also include simulating diffused charge associated with a position of the SEM image. The method may further include providing an enhanced SEM image based on the SEM image and the diffused charge.
Public/Granted literature
- US20220293389A1 NUMERICALLY COMPENSATING SEM-INDUCED CHARGING USING DIFFUSION-BASED MODEL Public/Granted day:2022-09-15
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