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公开(公告)号：US11668661B2
公开(公告)日：2023-06-06
申请号：US17019149
申请日：2020-09-11
发明人： Thomas Jarik Huisman , Sander Frederik Wuister , Hermanus Adrianus Dillen , Dorothea Maria Christina Oorschot
CPC分类号： G01N23/2251 , G03F1/84 , G03F7/7085 , G03F7/70608 , G06T7/0004 , G06T7/62 , G01N2223/07 , G01N2223/401 , G01N2223/507 , G06T2207/10061 , G06T2207/30148
摘要： Apparatuses, systems, and methods for inspecting a semiconductor sample are disclosed. In some embodiments, the sample may comprise a structure having a plurality of openings in a top layer of the structure. In some embodiments, the method may comprise generating an image of the structure using a SEM; inspecting an opening of the plurality of openings by determining a dimension of the opening based on the image and determining an open-state of the opening, based on a contrast of the image; and determining a quality of the opening based on both the determined dimension and the determined open-state of the opening.
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公开(公告)号：US11733614B2
公开(公告)日：2023-08-22
申请号：US17467441
申请日：2021-09-06
CPC分类号： G03F7/70625 , G01B9/04 , G03F1/84 , G03F1/86 , G06T7/12 , G06T2207/10061 , G06T2207/20168 , G06T2207/30148
摘要： Disclosed is a method of, and associated apparatus for, determining an edge position relating to an edge of a feature comprised within an image, such as a scanning electron microscope image, which comprises noise. The method comprises determining a reference signal from said image; and determining said edge position with respect to said reference signal. The reference signal may be determined from the image by applying a 1-dimensional low-pass filter to the image in a direction parallel to an initial contour estimating the edge position.
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公开(公告)号：US11243179B2
公开(公告)日：2022-02-08
申请号：US16652231
申请日：2018-10-01
IPC分类号： G01N23/2251 , G01B15/00 , G03F7/20 , H01J37/065 , H01J37/073 , H01J37/22 , H01J37/28
摘要： An inspection method for a substrate, the inspection method including: providing an electron beam having a first polarization state to a sample of the semiconductor substrate; detecting a first response signal of the sample caused by interaction of the electron beam having the first polarization state with the sample; providing an electron beam having a second polarization state to the sample of the semiconductor substrate; detecting a second response signal of the sample caused by interaction of the electron beam having the second polarization state with the sample; and determining a geometric or material property of the sample, based on the first response signal and the second response signal.
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公开(公告)号：US20190294055A1
公开(公告)日：2019-09-26
申请号：US16362025
申请日：2019-03-22
摘要： Disclosed is a method of, and associated apparatus for, determining an edge position relating to an edge of a feature comprised within an image, such as a scanning electron microscope image, which comprises noise. The method comprises determining a reference signal from said image; and determining said edge position with respect to said reference signal. The reference signal may be determined from the image by applying a 1-dimensional low-pass filter to the image in a direction parallel to an initial contour estimating the edge position.
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公开(公告)号：US11112703B2
公开(公告)日：2021-09-07
申请号：US16362025
申请日：2019-03-22
摘要： Disclosed is a method of, and associated apparatus for, determining an edge position relating to an edge of a feature comprised within an image, such as a scanning electron microscope image, which comprises noise. The method comprises determining a reference signal from said image; and determining said edge position with respect to said reference signal. The reference signal may be determined from the image by applying a 1-dimensional low-pass filter to the image in a direction parallel to an initial contour estimating the edge position.
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