Invention Application
- Patent Title: Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma
- Patent Title (中): 磁阻等离子体磁感应耦合等离子体反应器
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Application No.: US09773409Application Date: 2001-01-31
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Publication No.: US20010004920A1Publication Date: 2001-06-28
- Inventor: Peter K. Loewenhardt , Gerald Z. Yin , Philip M. Salzman
- Applicant: Applied Materials, Inc.
- Applicant Address: null
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: null
- Main IPC: H01L021/3065
- IPC: H01L021/3065

Abstract:
The invention is embodied in a plasma reactor including a chamber enclosure having a process gas inlet and including a ceiling, a sidewall and a workpiece support pedestal capable of supporting a workpiece at a plasma processing location facing the ceiling, the workpiece processing location and ceiling defining a process region therebetween, the pedestal being spaced from said sidewall to define a pumping annulus therebetween having inner and outer walls, to permit process gas to be evacuated therethrough from the process region. The invention further includes a pair of opposing plasma confinement magnetic poles arranged adjacent the annulus within one of the inner and outer walls of the annulus, the opposing magnetic poles being axially displaced from one another the opposite poles being oriented to provide maximum magnetic flux in a direction across the annulus and a magnetic flux at the processing location less than the magnetic flux across the annulus.
Public/Granted literature
- US06402885B2 Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma Public/Granted day:2002-06-11
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